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This is an introduction to the lineup of parallel light exposure devices.
As a uniform irradiation light source, it is used for various applications such as precision pattern exposure, pattern exposure of semiconductor device elements, and wafer exposure.
It is a compactly designed parallel light exposure device.
This device is a parallel light exposure system using a point light source of a super high-pressure mercury lamp, employing a collimation mirror method. The main components consist of a light source section, an adsorption-type exposure table section, and a mask section, with the exposure method capable of vacuum contact (hard contact) exposure. Upon request, a proximity method is also available. To manage exposure, it is equipped with an integrated light meter, making it easier to set the appropriate exposure amount. It is a compactly designed exposure device with a stand. For more details, please contact us or download the catalog.
